{"created":"2023-05-15T12:36:41.491495+00:00","id":1515,"links":{},"metadata":{"_buckets":{"deposit":"0b3de18b-d8bc-457b-a89a-c2d348da5dd2"},"_deposit":{"created_by":2,"id":"1515","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"1515"},"status":"published"},"_oai":{"id":"oai:kutarr.kochi-tech.ac.jp:00001515","sets":["28:37"]},"author_link":["4290","4289","4288","4291","4292","4293"],"item_7_alternative_title_21":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Development of the Novel Thin Film Fabrication Technology using Mist,“Mist CVD”and Oxide TFT with a-IGZO/AlOx Stack Grown under Atmosphere by the Mist CVD"}]},"item_7_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2012-07-31","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"53","bibliographicPageStart":"37","bibliographicVolumeNumber":"9","bibliographic_titles":[{"bibliographic_title":"高知工科大学紀要"}]}]},"item_7_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"4291","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Kawaharamura, Toshiyuki"}]},{"nameIdentifiers":[{"nameIdentifier":"4292","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Wang, Dapeng"}]},{"nameIdentifiers":[{"nameIdentifier":"4293","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Furuta, Mamoru"}]}]},"item_7_publisher_35":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"高知工科大学"}]},"item_7_source_id_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11954573","subitem_source_identifier_type":"NCID"}]},"item_7_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"1348-4842","subitem_source_identifier_type":"ISSN"}]},"item_7_version_type_18":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"川原村, 敏幸"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"王, 大鵬"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"古田, 守"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-02-13"}],"displaytype":"detail","filename":"rb9_037_053.pdf","filesize":[{"value":"4.6 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"rb9_037_053.pdf","url":"https://kutarr.kochi-tech.ac.jp/record/1515/files/rb9_037_053.pdf"},"version_id":"fada16ba-76d1-42bf-951c-bd85de96ca4e"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"ミストを利用した薄膜作製技術「ミストCVD法」の開発と「a-IGZO/AlOx 構造を有する酸化物 TFTの大気圧形成」","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ミストを利用した薄膜作製技術「ミストCVD法」の開発と「a-IGZO/AlOx 構造を有する酸化物 TFTの大気圧形成」"}]},"item_type_id":"7","owner":"2","path":["37"],"pubdate":{"attribute_name":"公開日","attribute_value":"2012-10-17"},"publish_date":"2012-10-17","publish_status":"0","recid":"1515","relation_version_is_last":true,"title":["ミストを利用した薄膜作製技術「ミストCVD法」の開発と「a-IGZO/AlOx 構造を有する酸化物 TFTの大気圧形成」"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-05-15T13:59:34.163090+00:00"}