@article{oai:kutarr.kochi-tech.ac.jp:00000084,
 author = {Kawasegi, Noritaka and Morita, Noboru and Yamada, Shigeru and Takano, Noboru and Oyama, Tatsuo and Ashida, Kiwamu and Taniguchi, Jun and Miyamoto, Iwao and Momota, Sadao and Ofune, Hitoshi},
 issue = {14},
 journal = {Applied Physics Letters},
 month = {Oct},
 note = {A simple and rapid method is proposed for nanoscale patterning on a metallic glass surface using focused ion beam irradiation followed by wet etching. It was found that the etch rate of a metallic glass surface irradiated with Ga+ ions could be drastically changed, and rapid patterning was possible with this method. Cross-sectional transmission electron microscopy observation reveals that the metallic glass substrate maintains an amorphous phase following irradiation. Etching enhancement was not observed for irradiation with Ar+ ions. The results indicate that enhancement of etching results from the presence of implanted Ga+ ions rather than a change in crystallography.},
 pages = {143115-1--143115-3},
 title = {Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching},
 volume = {89},
 year = {2006}
}