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Well-arrayed ZnO nanostructures formed by multi-annealing processes at low temperature
http://hdl.handle.net/10173/1375
http://hdl.handle.net/10173/137574ba3265-f6cf-49ca-bf87-a131d800ce35
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27-35.pdf (3.4 MB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2016-03-25 | |||||
タイトル | ||||||
タイトル | Well-arrayed ZnO nanostructures formed by multi-annealing processes at low temperature | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Wang, Dapeng
× Wang, Dapeng× Li, Zeming× Kawaharamura, Toshiyuki× Furuta, Mamoru× Narusawa, Tadashi× Li, Chaoyang |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | A novel process of multi-annealing was proposed for forming well-arrayed ZnO nanostructures on as-deposited ZnO thin films that were prepared on quartz glass using a radio frequency (rf) magnetron sputtering at low temperature. It was found that the formation and morphology of ZnO nanostructures were strongly dependent on the reducing gas annealing processes. Oxygen ambient annealing between two reducing annealing processes had the effect of introducing more oxygen into the ZnO thin film, as well as improving the crystallinity of the ZnO nanostructures. An intense photoluminescence peak centered at 504 nm was observed in the well-arrayed ZnO nanostructures, due to the large amount of oxygen vacancies which existed on the larger surface area of ZnO nanostructures formed after the multi-annealing processes at a low temperature of 430 ℃. These results show that multi-annealing processes are very effective in forming well-arrayed and controllable ZnO nanostructures. | |||||
書誌情報 |
Physica Status Solidi (C) 巻 9, 号 2, p. 194-197, 発行日 2012 |
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DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.1002/pssc.201100271 | |||||
権利 | ||||||
権利情報 | This is the accepted version of the following article: Wang, D., Li, Z., Kawaharamura, T., Furuta, M., Narusawa, T. and Li, C. (2012), Well-arrayed ZnO nanostructures formed by multi-annealing processes at low temperature. Phys. Status Solidi C, 9: 194-197, which has been published in final form at http://dx.doi.org/10.1002/pssc.201100271 | |||||
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出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
出版者 | ||||||
出版者 | WILEY-VCH Verlag GmbH |