| Item type |
学術雑誌論文 / Journal Article(1) |
| 公開日 |
2010-11-25 |
| タイトル |
|
|
タイトル |
Investigation of Water-Vapor Plasma Excited by Microwaves as Ultraviolet Light Source |
| 言語 |
|
|
言語 |
eng |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
Absolute spectrum calibration |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
OH radical |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
microwave |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
optical-emission spectroscopy (OES) |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
rotational temperature |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
saturated water-vapor pressure |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
ultraviolet (UV) |
| キーワード |
|
|
主題Scheme |
Other |
|
主題 |
water-vapor discharge |
| 資源タイプ |
|
|
資源タイプ識別子 |
http://purl.org/coar/resource_type/c_6501 |
|
資源タイプ |
journal article |
| 著者 |
Oh, Jun-Seok
Kawamura, K.
Pramanik, B.K.
Hatta, A.
|
| 抄録 |
|
|
内容記述タイプ |
Abstract |
|
内容記述 |
The potential of using water-vapor plasmas excited by microwaves as a ultraviolet (UV) light source has been investigated by using various pressures and input powers. The UV irradiation power increased and saturated at a pressure range dependent on the input power. On the other hand, other visible and infrared emissions corresponding to four atomic lines, i.e., the Balmer series of hydrogen at 486.1 nm (Hβ) and 656.3 nm (Hα) and oxygen atoms at 777.2 and 844.6 nm, were clearly decreased with an increase in the total gas pressure. It was found that pressures (1.4–2.0 kPa) near the saturated water-vapor pressure were found to give the most intense UV irradiation. With a vapor pressure of 1.6 kPa and a total microwave power of 300 W, the power density of UV (Γuv) was measured to be 10.5 μW · cm−2 at a distance of 30 cm from the center of the discharge tube as measured through an optical viewing port on the cavity discharge applicator. This value for (Γuv) is comparable to that for a mercury lamp. However, the (ηuv) efficiency was estimated to be considerably lower than that of a mercury lamp. |
| 書誌情報 |
IEEE Transactions on Plasma Science
巻 37,
号 1,
p. 107-112,
発行日 2009-01
|
| ISSN |
|
|
収録物識別子タイプ |
ISSN |
|
収録物識別子 |
0093-3813 |
| 書誌レコードID |
|
|
収録物識別子タイプ |
NCID |
|
収録物識別子 |
AA0066803X |
| DOI |
|
|
関連タイプ |
isIdenticalTo |
|
|
識別子タイプ |
DOI |
|
|
関連識別子 |
10.1109/TPS.2008.2007732 |
| 権利 |
|
|
権利情報 |
© 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. |
| 著者版フラグ |
|
|
出版タイプ |
VoR |
|
出版タイプResource |
http://purl.org/coar/version/c_970fb48d4fbd8a85 |
| 出版者 |
|
|
出版者 |
Institute of Electrical and Electronics Engineers (IEEE) |
IEEE_TPS_37-1_107.pdf (520.4 kB)
