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Ion-beam lithography by use of highly charged Ar-ion beam
http://hdl.handle.net/10173/612
http://hdl.handle.net/10173/61284407557-4978-4b91-9fdd-e3d543b490e5
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
RSI_77_3_03c111.pdf (365.3 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
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| 公開日 | 2010-12-28 | |||||
| タイトル | ||||||
| タイトル | Ion-beam lithography by use of highly charged Ar-ion beam | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | ion beam lithography | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | etching | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | cyclotron resonance | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| 著者 |
Momota, Sadao
× Momota, Sadao× Iwamitsu, Shingo× Goto, Shougo× Nojiri, Yoichi× Taniguchi, Jun× Miyamoto, Iwao× Ohno, Hirohisa× Morita, Noboru× Kawasegi, Noritaka |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | In order to fabricate a nanoscale three-dimensional (3D) structure by using the ion-beam lithography (IBL), we tried to control the etching rate and the etching depth by means of the charge state, the beam energy, and the fluence of the ion beam. Ar-ion beams with E=90 keV and 80-400 keV were irradiated onto spin on glass (SOG) and Si, respectively. The Ar ions were prepared by a facility built at the Kochi University of Technology, which included an electron cyclotron resonance ion source (NANOGAN, 10 GHz). It was found that the irradiation of highly charged ions (HCIs) enhanced the etching rate of SOG. The etching rate and etching depth of Si were controlled by the beam energy and the fluence of Ar4+ ions. The present results show the effectiveness of IBL with HCIs to fabricate a nanoscale 3D structure. | |||||
| 書誌情報 |
Review of Scientific Instruments 巻 77, 号 3, p. 03C111-1-03C111-3, 発行日 2006-03-22 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0034-6748@@@1089-7623 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA00817730@@@AA12442307 | |||||
| DOI | ||||||
| 関連タイプ | isIdenticalTo | |||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1063/1.2165269 | |||||
| 権利 | ||||||
| 権利情報 | Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Rev. Sci. Instrum. 77, 03C111 (2006) and may be found at http://link.aip.org/link/?rsi/77/03C111 | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
| 出版者 | ||||||
| 出版者 | American Institute of Physics | |||||
| 関係URI | ||||||
| 識別子タイプ | URI | |||||
| 関連識別子 | http://link.aip.org/link/?rsi/77/03C111 | |||||
| 関連名称 | http://link.aip.org/link/?rsi/77/03C111 | |||||
