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  1. 紀要
  2. 第02巻

Applications of Highly Charged Ar Ion Beams to Ion Beam Lithography

http://hdl.handle.net/10173/131
http://hdl.handle.net/10173/131
f78357b5-54be-4f77-8721-85afd263bee9
名前 / ファイル ライセンス アクション
72-75.pdf 72-75.pdf (574.1 kB)
Item type 紀要論文 / Departmental Bulletin Paper(1)
公開日 2007-08-21
タイトル
タイトル Applications of Highly Charged Ar Ion Beams to Ion Beam Lithography
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ departmental bulletin paper
著者 百田, 佐多生

× 百田, 佐多生

WEKO 3485

百田, 佐多生

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野尻, 洋一

× 野尻, 洋一

WEKO 3486

野尻, 洋一

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浜川, 恒圭

× 浜川, 恒圭

WEKO 3487

浜川, 恒圭

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濱口, 顕典

× 濱口, 顕典

WEKO 3488

濱口, 顕典

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書誌情報 高知工科大学紀要

巻 2, 号 1, p. 72-75, 発行日 2005-03-31
ISSN
収録物識別子タイプ ISSN
収録物識別子 1348-4842
書誌レコードID
収録物識別子タイプ NCID
収録物識別子 AA11954573
著者版フラグ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
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