{"_buckets": {"deposit": "80778fba-1c0a-41f3-b16e-a2279e3ddbd8"}, "_deposit": {"created_by": 2, "id": "145", "owners": [2], "pid": {"revision_id": 0, "type": "depid", "value": "145"}, "status": "published"}, "_oai": {"id": "oai:kutarr.kochi-tech.ac.jp:00000145", "sets": ["5"]}, "author_link": ["551", "550"], "item_2_alternative_title_21": {"attribute_name": "その他のタイトル", "attribute_value_mlt": [{"subitem_alternative_title": "Highly charged ion beams applied to exposure process"}]}, "item_2_biblio_info_7": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2009-06-01", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "6", "bibliographicPageEnd": "351", "bibliographicPageStart": "348", "bibliographicVolumeNumber": "53", "bibliographic_titles": [{"bibliographic_title": "砥粒加工学会誌"}]}]}, "item_2_full_name_3": {"attribute_name": "著者別名", "attribute_value_mlt": [{"nameIdentifiers": [{"nameIdentifier": "551", "nameIdentifierScheme": "WEKO"}], "names": [{"name": "MOMOTA, Sadao"}]}]}, "item_2_publisher_35": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "砥粒加工学会"}]}, "item_2_source_id_11": {"attribute_name": "書誌レコードID", "attribute_value_mlt": [{"subitem_source_identifier": "AN10192823", "subitem_source_identifier_type": "NCID"}]}, "item_2_source_id_9": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0914-2703", "subitem_source_identifier_type": "ISSN"}]}, "item_2_version_type_18": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "百田, 佐多生"}], "nameIdentifiers": [{"nameIdentifier": "550", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2019-02-13"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "JSAT_53_6_348.pdf", "filesize": [{"value": "3.5 MB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 3500000.0, "url": {"label": "JSAT_53_6_348.pdf", "url": "https://kutarr.kochi-tech.ac.jp/record/145/files/JSAT_53_6_348.pdf"}, "version_id": "1f61cf19-9cc4-4b82-a7b7-204c34d9615d"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "highly charged ion", "subitem_subject_scheme": "Other"}, {"subitem_subject": "ion beam lithography", "subitem_subject_scheme": "Other"}, {"subitem_subject": "micro-nano fabrication", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "jpn"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "多価イオンビームによる露光技術", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "多価イオンビームによる露光技術"}]}, "item_type_id": "2", "owner": "2", "path": ["5"], "permalink_uri": "http://hdl.handle.net/10173/748", "pubdate": {"attribute_name": "公開日", "attribute_value": "2011-10-31"}, "publish_date": "2011-10-31", "publish_status": "0", "recid": "145", "relation": {}, "relation_version_is_last": true, "title": ["多価イオンビームによる露光技術"], "weko_shared_id": -1}