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Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching
http://hdl.handle.net/10173/610
http://hdl.handle.net/10173/610214888e7-edde-4ac3-bb21-e7072c631ea6
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
APL_89_14_143115.pdf (300.0 kB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
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| 公開日 | 2010-12-27 | |||||
| タイトル | ||||||
| タイトル | Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | zirconium alloys | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | copper alloys | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | aluminium alloys | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | metallic glasses | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | amorphous state | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | focused ion beam technology | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | sputter etching | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | nanopatterning | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | ion implantation | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | transmission electron microscopy | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | nickel alloys | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| 著者 |
Kawasegi, Noritaka
× Kawasegi, Noritaka× Morita, Noboru× Yamada, Shigeru× Takano, Noboru× Oyama, Tatsuo× Ashida, Kiwamu× Taniguchi, Jun× Miyamoto, Iwao× Momota, Sadao× Ofune, Hitoshi |
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| 抄録 | ||||||
| 内容記述タイプ | Abstract | |||||
| 内容記述 | A simple and rapid method is proposed for nanoscale patterning on a metallic glass surface using focused ion beam irradiation followed by wet etching. It was found that the etch rate of a metallic glass surface irradiated with Ga+ ions could be drastically changed, and rapid patterning was possible with this method. Cross-sectional transmission electron microscopy observation reveals that the metallic glass substrate maintains an amorphous phase following irradiation. Etching enhancement was not observed for irradiation with Ar+ ions. The results indicate that enhancement of etching results from the presence of implanted Ga+ ions rather than a change in crystallography. | |||||
| 書誌情報 |
Applied Physics Letters 巻 89, 号 14, p. 143115-1-143115-3, 発行日 2006-10-06 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 0003-6951 | |||||
| 書誌レコードID | ||||||
| 収録物識別子タイプ | NCID | |||||
| 収録物識別子 | AA00543431 | |||||
| DOI | ||||||
| 関連タイプ | isIdenticalTo | |||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1063/1.2360181 | |||||
| 権利 | ||||||
| 権利情報 | Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 89, 143115 (2006) and may be found at http://link.aip.org/link/?apl/89/143115 | |||||
| 著者版フラグ | ||||||
| 出版タイプ | VoR | |||||
| 出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
| 出版者 | ||||||
| 出版者 | American Institute of Physics | |||||
| 関係URI | ||||||
| 識別子タイプ | URI | |||||
| 関連識別子 | http://link.aip.org/link/?apl/89/143115 | |||||
| 関連名称 | http://link.aip.org/link/?apl/89/143115 | |||||
