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  1. 学術雑誌論文

Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching

http://hdl.handle.net/10173/610
http://hdl.handle.net/10173/610
214888e7-edde-4ac3-bb21-e7072c631ea6
名前 / ファイル ライセンス アクション
APL_89_14_143115.pdf APL_89_14_143115.pdf (300.0 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2010-12-27
タイトル
タイトル Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching
言語
言語 eng
キーワード
主題Scheme Other
主題 zirconium alloys
キーワード
主題Scheme Other
主題 copper alloys
キーワード
主題Scheme Other
主題 aluminium alloys
キーワード
主題Scheme Other
主題 metallic glasses
キーワード
主題Scheme Other
主題 amorphous state
キーワード
主題Scheme Other
主題 focused ion beam technology
キーワード
主題Scheme Other
主題 sputter etching
キーワード
主題Scheme Other
主題 nanopatterning
キーワード
主題Scheme Other
主題 ion implantation
キーワード
主題Scheme Other
主題 transmission electron microscopy
キーワード
主題Scheme Other
主題 nickel alloys
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
著者 Kawasegi, Noritaka

× Kawasegi, Noritaka

WEKO 306

Kawasegi, Noritaka

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Morita, Noboru

× Morita, Noboru

WEKO 307

Morita, Noboru

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Yamada, Shigeru

× Yamada, Shigeru

WEKO 308

Yamada, Shigeru

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Takano, Noboru

× Takano, Noboru

WEKO 309

Takano, Noboru

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Oyama, Tatsuo

× Oyama, Tatsuo

WEKO 310

Oyama, Tatsuo

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Ashida, Kiwamu

× Ashida, Kiwamu

WEKO 311

Ashida, Kiwamu

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Taniguchi, Jun

× Taniguchi, Jun

WEKO 312

Taniguchi, Jun

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Miyamoto, Iwao

× Miyamoto, Iwao

WEKO 313

Miyamoto, Iwao

Search repository
Momota, Sadao

× Momota, Sadao

WEKO 314

Momota, Sadao

Search repository
Ofune, Hitoshi

× Ofune, Hitoshi

WEKO 315

Ofune, Hitoshi

Search repository
抄録
内容記述タイプ Abstract
内容記述 A simple and rapid method is proposed for nanoscale patterning on a metallic glass surface using focused ion beam irradiation followed by wet etching. It was found that the etch rate of a metallic glass surface irradiated with Ga+ ions could be drastically changed, and rapid patterning was possible with this method. Cross-sectional transmission electron microscopy observation reveals that the metallic glass substrate maintains an amorphous phase following irradiation. Etching enhancement was not observed for irradiation with Ar+ ions. The results indicate that enhancement of etching results from the presence of implanted Ga+ ions rather than a change in crystallography.
書誌情報 Applied Physics Letters

巻 89, 号 14, p. 143115-1-143115-3, 発行日 2006-10-06
ISSN
収録物識別子タイプ ISSN
収録物識別子 0003-6951
書誌レコードID
収録物識別子タイプ NCID
収録物識別子 AA00543431
DOI
関連タイプ isIdenticalTo
識別子タイプ DOI
関連識別子 10.1063/1.2360181
権利
権利情報 Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 89, 143115 (2006) and may be found at http://link.aip.org/link/?apl/89/143115
著者版フラグ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
出版者
出版者 American Institute of Physics
関係URI
識別子タイプ URI
関連識別子 http://link.aip.org/link/?apl/89/143115
関連名称 http://link.aip.org/link/?apl/89/143115
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