{"_buckets": {"deposit": "02af2271-2ae1-490e-b93b-d1932cf6794b"}, "_deposit": {"created_by": 2, "id": "84", "owners": [2], "pid": {"revision_id": 0, "type": "depid", "value": "84"}, "status": "published"}, "_oai": {"id": "oai:kutarr.kochi-tech.ac.jp:00000084", "sets": ["5"]}, "author_link": ["312", "309", "315", "306", "311", "307", "314", "310", "308", "313"], "item_2_biblio_info_7": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2006-10-06", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "14", "bibliographicPageEnd": "143115-3", "bibliographicPageStart": "143115-1", "bibliographicVolumeNumber": "89", "bibliographic_titles": [{"bibliographic_title": "Applied Physics Letters"}]}]}, "item_2_description_4": {"attribute_name": "抄録", "attribute_value_mlt": [{"subitem_description": "A simple and rapid method is proposed for nanoscale patterning on a metallic glass surface using focused ion beam irradiation followed by wet etching. It was found that the etch rate of a metallic glass surface irradiated with Ga+ ions could be drastically changed, and rapid patterning was possible with this method. Cross-sectional transmission electron microscopy observation reveals that the metallic glass substrate maintains an amorphous phase following irradiation. Etching enhancement was not observed for irradiation with Ar+ ions. The results indicate that enhancement of etching results from the presence of implanted Ga+ ions rather than a change in crystallography.", "subitem_description_type": "Abstract"}]}, "item_2_publisher_35": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "American Institute of Physics"}]}, "item_2_relation_13": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type": "isIdenticalTo", "subitem_relation_type_id": {"subitem_relation_type_id_text": "10.1063/1.2360181", "subitem_relation_type_select": "DOI"}}]}, "item_2_relation_44": {"attribute_name": "関係URI", "attribute_value_mlt": [{"subitem_relation_name": [{"subitem_relation_name_text": "http://link.aip.org/link/?apl/89/143115"}], "subitem_relation_type_id": {"subitem_relation_type_id_text": "http://link.aip.org/link/?apl/89/143115", "subitem_relation_type_select": "URI"}}]}, "item_2_rights_14": {"attribute_name": "権利", "attribute_value_mlt": [{"subitem_rights": "Copyright 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Appl. Phys. Lett. 89, 143115 (2006) and may be found at http://link.aip.org/link/?apl/89/143115"}]}, "item_2_source_id_11": {"attribute_name": "書誌レコードID", "attribute_value_mlt": [{"subitem_source_identifier": "AA00543431", "subitem_source_identifier_type": "NCID"}]}, "item_2_source_id_9": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "0003-6951", "subitem_source_identifier_type": "ISSN"}]}, "item_2_version_type_18": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Kawasegi, Noritaka"}], "nameIdentifiers": [{"nameIdentifier": "306", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Morita, Noboru"}], "nameIdentifiers": [{"nameIdentifier": "307", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Yamada, Shigeru"}], "nameIdentifiers": [{"nameIdentifier": "308", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Takano, Noboru"}], "nameIdentifiers": [{"nameIdentifier": "309", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Oyama, Tatsuo"}], "nameIdentifiers": [{"nameIdentifier": "310", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Ashida, Kiwamu"}], "nameIdentifiers": [{"nameIdentifier": "311", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Taniguchi, Jun"}], "nameIdentifiers": [{"nameIdentifier": "312", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Miyamoto, Iwao"}], "nameIdentifiers": [{"nameIdentifier": "313", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Momota, Sadao"}], "nameIdentifiers": [{"nameIdentifier": "314", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Ofune, Hitoshi"}], "nameIdentifiers": [{"nameIdentifier": "315", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2019-02-13"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "APL_89_14_143115.pdf", "filesize": [{"value": "300.0 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 300000.0, "url": {"label": "APL_89_14_143115.pdf", "url": "https://kutarr.kochi-tech.ac.jp/record/84/files/APL_89_14_143115.pdf"}, "version_id": "d24d62d3-612f-419d-b756-5b2695ea797a"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "zirconium alloys", "subitem_subject_scheme": "Other"}, {"subitem_subject": "copper alloys", "subitem_subject_scheme": "Other"}, {"subitem_subject": "aluminium alloys", "subitem_subject_scheme": "Other"}, {"subitem_subject": "metallic glasses", "subitem_subject_scheme": "Other"}, {"subitem_subject": "amorphous state", "subitem_subject_scheme": "Other"}, {"subitem_subject": "focused ion beam technology", "subitem_subject_scheme": "Other"}, {"subitem_subject": "sputter etching", "subitem_subject_scheme": "Other"}, {"subitem_subject": "nanopatterning", "subitem_subject_scheme": "Other"}, {"subitem_subject": "ion implantation", "subitem_subject_scheme": "Other"}, {"subitem_subject": "transmission electron microscopy", "subitem_subject_scheme": "Other"}, {"subitem_subject": "nickel alloys", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching"}]}, "item_type_id": "2", "owner": "2", "path": ["5"], "permalink_uri": "http://hdl.handle.net/10173/610", "pubdate": {"attribute_name": "公開日", "attribute_value": "2010-12-27"}, "publish_date": "2010-12-27", "publish_status": "0", "recid": "84", "relation": {}, "relation_version_is_last": true, "title": ["Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching"], "weko_shared_id": -1}