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  1. 学術雑誌論文

Influence of sputtering pressure on band gap of Zn_<1−x>Mg_xO thin films prepared by radio frequency magnetron sputtering

http://hdl.handle.net/10173/1379
http://hdl.handle.net/10173/1379
8cd91c90-c1bb-47ef-9129-1bf476b60f92
名前 / ファイル ライセンス アクション
27-34.pdf 27-34.pdf (597.0 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2016-03-25
タイトル
タイトル Influence of sputtering pressure on band gap of Zn_<1−x>Mg_xO thin films prepared by radio frequency magnetron sputtering
言語
言語 eng
資源タイプ
資源タイプ識別子 http://purl.org/coar/resource_type/c_6501
資源タイプ journal article
著者 Wang, Dapeng

× Wang, Dapeng

WEKO 1056

Wang, Dapeng

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Narusawa, Tadashi

× Narusawa, Tadashi

WEKO 1057

Narusawa, Tadashi

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Kawaharamura, Toshiyuki

× Kawaharamura, Toshiyuki

WEKO 1058

Kawaharamura, Toshiyuki

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Furuta, Mamoru

× Furuta, Mamoru

WEKO 1059

Furuta, Mamoru

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Li, Chaoyang

× Li, Chaoyang

WEKO 1060

Li, Chaoyang

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抄録
内容記述タイプ Abstract
内容記述 Zn_<1−x> Mg_x O thin films were deposited onto quartz glass substrates using a radio frequency magnetron sputtering at various depositionpressures. It was found that the Mg concentration in the Zn_<1−x> Mg_xO thin films significantly increased by decreasing the depositionpressure from 9 to 1 Pa, which contributed to an increase in the band gap of the ZnMgO films. In addition, the Zn_<1−x> Mg_xO thin films, which had a hexagonal wurtzite structure when obtained by high pressure deposition (7 and 9 Pa) at x ≤ 0.478, had a cubic rock-salt crystal structure when deposition pressure was decreased to 1-5 Pa at x ≥ 0.482. These results show that the band gap of the ZnMgO thin films could be easily modulated only by adjusting of the deposition pressure during the radio frequency sputtering process.
書誌情報 Journal of Vacuum Science and Technology B

巻 29, 号 5, p. 051205-1-051205-4, 発行日 2011
DOI
関連タイプ isIdenticalTo
識別子タイプ DOI
関連識別子 10.1116/1.3622316
権利
権利情報 © 2011 American Vacuum Society
権利
権利情報 American Institute of Physics, Dapeng Wang, Tadashi Narusawa, Toshiyuki Kawaharamura, Mamoru Furuta and Chaoyang Li, Journal of Vacuum Science and Technology B, 29(5), 2011, p051205-1-4
権利(URI)
権利情報 http://scitation.aip.org/content/avs/journal/jvstb/29/5/10.1116/1.3622316 | http://scitation.aip.org/content/avs/journal/jvstb/29/5/10.1116/1.3622316
著者版フラグ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
出版者
出版者 American Institute of Physics
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